Physics and Technology of High-k Gate Dielectrics II Proceedings of the Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : Held in Orlando, Florida, October 12-16, 2003 - Samares Kar

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Physics and Technology of High-k Gate Dielectrics II Proceedings of the Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : Held in Orlando, Florida, October 12-16, 2003

par

Langue: Anglais
Publié en: 2004
Maison d'édition: The Electrochemical Society
Pages: 490
ISBN: 9781566774055

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